Semi Materials Co., Ltd.

Electrodes of graphite or PyC for plasma etching

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Semi Materials Co., Ltd.
[Korea]

Address
Lojit venture bldg 4F, 22-2 Sunae-Dong, Bundang-Gu,  Sungnam-City Gyeonggi-do
Phone
82-31-7118978
Contact name
Mike. Jung

Description

The sort of material required for electrodes in plasma etching equipment is similar to that for ion implantation parts and PECVD wafer trays.

Physical properties of purity graphite (averages)
Physical Property
R6650
Density (g/cm3)
1.85
Porosity(open) (%)
10
Hardness Rockwell B (HR)
90
5/100
E-Modulus(N/mm2)
13500
Flexural Strength (N/mm2)
65
Compressive Strength (N/mm2)
150
Specific Electrical Resistance(mWm)
14
Thermal Expansion
(20~1000°C ; x10-6K-1)
5.0
Thermal Conductivity(W/mK)
90
Pressing Method
Isostatic Molded
WG : with grain.
AG : against grain.
If not stated otherwise, all values are measured with a test piece the axis of which is cut with grain.


Typical analysis
Element Concentration
-
code
Ash
Value
Al
B
Ca
Co
Cr
Cu
Fe
K
Mg
Mn
Na
Ni
P
S
Si
Ti
V
High purity
P
20ppm
<0.1
1
1
<0.1
<0.1
0.2
0.5
<1
0.15
<0.1
<1
<0.1
<0.3
<2
<2
0.5
0.2
Super
pure
S
5ppm
<0.1
0.05
0.3
<0.1
<0.1
0.1
0.3
<1
0.05
<0.1
<1
<0.1
<0.3
<2
0.5
0.3
0.1


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