Semi Materials Co., Ltd.

Graphite for ion implantation

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Semi Materials Co., Ltd.
[Korea]

Address
Lojit venture bldg 4F, 22-2 Sunae-Dong, Bundang-Gu,  Sungnam-City Gyeonggi-do
Phone
82-31-7118978
Contact name
Mike. Jung

Description

Fine-grained high density graphites exhibit very low erosion even in extreme working conditions as in ion bombardment or in plasma.

Metal parts in ion implantation equipment are normally subject to high wear caused by ion beams but can be protected by suitable graphite shields.

As well as parts for graphite shileds. we supply electrodes and ion sources (arc chamber) made of erosion resistant high purity graphites.

Grade recommendation
R6650P


Physical properties of purity graphite (averages)
Physical Property
R6650
Density (g/cm3)
1.85
Porosity(open) (%)
10
Hardness Rockwell B (HR)
90
5/100
E-Modulus(N/mm2)
13500
Flexural Strength (N/mm2)
65
Compressive Strength (N/mm2)
150
Specific Electrical Resistance(mWm)
14
Thermal Expansion
(20~1000°C ; x10-6K-1)
5.0
Thermal Conductivity (W/mK)
90
Pressing Method
Isostatic Molded
WG : with grain.
AG : against grain.
If not stated otherwise, all values are measured with a test piece the axis of which is cut with grain.


Typical analysis
Element Concentration
-
code
Ash
Value
Al
B
Ca
Co
Cr
Cu
Fe
K
Mg
Mn
Na
Ni
P
S
Si
Ti
V
High purity
P
20ppm
<0.1
1
1
<0.1
<0.1
0.2
0.5
<1
0.15
<0.1
<1
<0.1
<0.3
<2
<2
0.5
0.2
Super
pure
S
5ppm
<0.1
0.05
0.3
<0.1
<0.1
0.1
0.3
<1
0.05
<0.1
<1
<0.1
<0.3
<2
0.5
0.3
0.1


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